FIELD: analytical instrument engineering. SUBSTANCE: the method of manufacture of gas transducer sensing element consists in application of metal phthalocyanine onto electrodes and subsequent radiation of the film by X-rays at an energy of 150 to 200 keV and dose of (4,5-9)103P.. EFFECT: facilitated procedure. 1 tbl
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD OF MANUFACTURE OF SEMICONDUCTOR GAS SENSOR | 1994 |
|
RU2065602C1 |
| METHOD FOR FLAW INSPECTION OF SILICON FILMS ON INSULATING SUBSTRATES | 2000 |
|
RU2185684C2 |
| METHOD FOR ANISOTROPIC ETCHING OF SILICON CRYSTALS | 1996 |
|
RU2106717C1 |
| METHOD FOR CARRYING OUT GETTERING TREATMENT OF EPITAXIAL LAYERS OF SEMICONDUCTOR STRUCTURES | 1999 |
|
RU2176422C2 |
| METHOD FOR STEAM-PHASE AND CHEMICAL PLASMA STIMULATION OF GAS-SENSING FILM DEPOSITION | 1994 |
|
RU2087048C1 |
| SENSOR OF GAS COMPOSITION | 1994 |
|
RU2100800C1 |
| PROCESS OF MANUFACTURE OF FILM RESISTORS | 1992 |
|
RU2046419C1 |
| SILICON-ON-INSULATOR STRUCTURE MANUFACTURING PROCESS | 2000 |
|
RU2193256C2 |
| PROCESS OF PHOTOLITHOGRAPHY | 1996 |
|
RU2096935C1 |
| RESISTIVE GAS TRANSDUCER | 1992 |
|
RU2038589C1 |
Authors
Dates
1997-02-20—Published
1994-03-30—Filed