DEVICE FOR SINGLE-SIDE PLATE ETCHING Russian patent published in 1997 - IPC

FIELD: electronic devices, in particular, chemical treatment of semiconductor plates. SUBSTANCE: device has bath for etching agent and cylindrical ring tank which is mounted inside bath for rotation in etching agent and which has magnets of inner side surface of external cylinder. Magnets which are mounted on side surface of cylindrical tank are located in opposite to magnets on yoke, which is connected to electric motor, which is located under bath. Inner side of cylindrical surface of ring tank has ring support for plate holder. In addition device has gas feeding tube which is located over plate holder. In addition ring bed has hole for gas removal. Holder of plates is designed as cylinder, which has lugs in lower part and support ring with tuning screws in upper part. Alternatively it is designed as cone frustum which has support ring with tuning screws. EFFECT: increased functional capabilities. 4 cl, 2 dwg