SEMICONDUCTOR STRUCTURE MANUFACTURING PROCESS Russian patent published in 1997 - IPC

Abstract RU 2087049 C1

FIELD: microelectronics; digital semiconductor devices and integrated circuits. SUBSTANCE: structures are periodically irradiated on nonworking side with alpha- particle flux from radioisotope radiation source at frequency of mHz range with equal radiation-pause half-cycles, and one of physical parameters responding to crystallographic flaws in structure is measured on working side before and after irradiation and recorded; radiation-pause cycles are repeated until recorded parameter is stabilized; after radiation, structure is held under normal conditions until relaxation processes fully stop. EFFECT: facilitated procedure.

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RU 2 087 049 C1

Authors

Skupov V.D.

Ivin A.L.

Komarova T.V.

Dates

1997-08-10Published

1994-11-09Filed