FIELD: vacuum engineering, in particular, vacuum application of thin films. SUBSTANCE: the offered device has vacuum chamber with source for film application, substrate holder and heater located behind it, movable flat hollow gate with, at least, one hole and located between source and substrate holder, and systems of supply of working gas and pumping out of it. Gate is connected with the system of working gas supply. EFFECT: higher quality of product treatment due to supply into hollow gate of dry and dedusted in filter gas containing solid particles of argon which, flowing through holes in gate, tears off microparticles found on the product. 3 cl, 2 dwg
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