INFRARED RADIATION SOURCE Russian patent published in 2001 - IPC

Abstract RU 2165663 C2

FIELD: microelectronics; low-inertia microelectronic infrared radiation sources. SUBSTANCE: device has silicon substrate carrying electroluminescent member made of silicon-containing material and provided with current-conducting contacts; this member is electrically insulated from substrate by means of passivating SiO2 coating. Electroluminescent member is made of SiC in the form of bridge. Most reasonable location of electroluminescent member is in hole made in substrate. EFFECT: enlarged infrared radiation range. 3 cl, 4 dwg, 1 tbl

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RU 2 165 663 C2

Authors

Luchinin V.V.

Korljakov A.V.

Kostromin S.V.

Nikitin I.V.

Dates

2001-04-20Published

1999-07-13Filed