APPARATUS FOR MEGASONIC CLEANING OF SEMICONDUCTOR PLATES Russian patent published in 2001 - IPC

FIELD: individual cleaning of articles, for example at manufacturing semiconductor devices, namely, operations for megasonic cleaning of silicon plates. SUBSTANCE: apparatus includes bath for cleaning with vacuumized table for fixing plates; cylindrical body of vessel with union for supplying water; nozzle secured to body of vessel; piezoirradiator mounted with use of pressure contact of spring and dielectric washer in bottom of piezoirradiator body. The last is cylindrical one and it is placed coaxially in body of vessel in such a way that lateral walls of both said bodies form annular cavity over outer plane of bottom of piezoirradiator body. There are annular grooves on inner and outer surfaces of bottom of piezoirradiator body. Body of vessel is arranged with possibility of reciprocation motion relative to bath in plane of cleaned plate. EFFECT: enhanced degree of cleaning, lowered energy consumption, simplified design of apparatus. 2 dwg