FIELD: electronic engineering; electronic and optoelectronic industries. SUBSTANCE: proposed p-n light-emitting diode is available of four alternatives. That of first alternative has its metal contact of p layer made in the form of single-crystal metal cylinder with body- or face-centered lattice 111 or 100, respectively. Contact of p layer may be made of following metals: molybdenum, tungsten, niobium, or other metals. Grown on outer surface of this contact is single-crystal cylindrical semiconductor p layer with cylindrical single-crystal n layer formed on its outer surface. Pair of cylindrical metal contacts of n layer formed of alloy of two metals is arranged over peripheral parts of n layer surface symmetrically from center. EFFECT: enhanced radiation power; reduced electrothermal destruction. 14 cl, 4 dwg
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SEMICONDUCTOR P-N INJECTION LASER (VERSIONS) | 2001 |
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RU2197046C2 |
GUNN-EFFECT DIODE (DESIGN VERSIONS) | 2000 |
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TRANSIT-TIME MICROWAVE DIODE (DESIGN VERSIONS) | 2000 |
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SCHOTTKY-BARRIER RECTIFIER DIODE (ALTERNATIVES) | 2000 |
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THYRISTOR | 2000 |
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BIPOLAR TRANSISTOR | 2000 |
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INSULATED-GATE FIELD-EFFECT TRANSISTOR | 2000 |
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SEMICONDUCTOR STRUCTURE WITH ACTIVE ZONE (ALTERNATIVES) | 2005 |
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RU2328795C2 |
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Authors
Dates
2001-11-10—Published
2001-02-23—Filed