FIELD: acceleration engineering. SUBSTANCE: device that may be used for generating high-energy multiple-beam ion beams of various elements in ion implanting plants and also for injecting heavy ion accelerators has extended tubular electrode mounted in vacuum chamber along ion- beam distribution axis, shaped high-voltage pulse of desired length being applied to this electrode at definite delay relative to laser radiation pulse. EFFECT: simplified design; enhanced energy of multiple-charge ions extracted from laser plasma. 2 cl, 1 dwg
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