DEVICE FOR PLASMA-CHEMICAL DEPOSITION OF MATERIALS FROM GAS PHASE Russian patent published in 2002 - IPC

FIELD: decorative coatings of silicon-containing materials applied by chemical deposition on dielectric surfaces. SUBSTANCE: device used for deposition of silicon-containing materials on glass, ceramic, porcelain, and other dielectric surfaces has plasma- chemical reactor with electrode system, high-frequency discharge excitation system, evacuation system, part heating system, and decorative coating automatic-control system. Novelty is that device has special- shape electrode system whose equipotential surface symmetry follows symmetry of part being coated and that electric-field steady component is used along with high-frequency field to control efficiency of deposition process. EFFECT: enhanced uniformity and efficiency of coating deposition. 3 dwg