METHOD OF MICROCHANNEL PLATE MANUFACTURE Russian patent published in 2003 - IPC

FIELD: technology of manufacturing microchannel plates with high gain factor, signal-to-noise ratio resolving power. SUBSTANCE: method includes location of evaporator at an angle to blank of microchannel plate and spraying of inlet contact electrode. Said spraying is effected from directed evaporator round which blank of microchannel plate is rotated and remains immovable relative to its axis. Blank of microchannel plate is made with channels perpendicular to its end face surface. Angle pf evaporator inclination to end face surface is selected so that depth of contact electrode inside channels of microchannel plate amounts up to 1.5-2.5 of channel diameter. EFFECT: higher efficiency of the first collision of electrons with channel wall, increased inlet transparency, reduced spread in depth of the first collision, excluded ellipticity of electron flow at channel outlets. 2 cl, 1 dwg