PROCESS OF MANUFACTURE OF MICROCHANNEL PLATE Russian patent published in 2002 - IPC

Abstract RU 2187166 C2

FIELD: manufacture of microchannel plates. SUBSTANCE: invention deals with technology of manufacture of microchannel plates with enhanced gain factor, signal-to-noise ratio, resolving power. Process includes deposition of metal contact electrode on input face surface and placement of evaporator at angle with workstock of microchannel plate. Input contact electrode is sprayed from directional evaporator in reference to which workstock of microchannel plate is rotated. Workstock is immobile with regard to own axis. Angle of inclination of evaporator with respect to face surface of workstock is so set that depth of contact electrode inside channel of microchannel plate is 1.5-2.0 diameter of channel. EFFECT: increased efficiency of first collision of electrons with walls of channels, enhanced transparency of entrance and diminished spread in depth of first collision. 1 cl, 1 dwg

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RU 2 187 166 C2

Authors

Kulov S.K.

Pergamentsev Ju.L.

Kesaev S.A.

Platov Eh.A.

Dates

2002-08-10Published

2000-08-15Filed