COATING DEPOSITION APPARATUS Russian patent published in 2003 - IPC

FIELD: mechanical and electrical engineering, electronic and chemical industry. SUBSTANCE: apparatus has vacuumizer, at least one magnetron sprayer, gas evacuation and supplying systems and gas flow regulating system, rotating turret-type cylindrical substrate moving device with closed ends, internal cavity and shaft hermetically joined to vacuumizer. Substrate moving device is made hermetically sealed and is filled with coolant. One end of hollow shaft is connected to internal cavity of substrate moving device and other end is positioned outside vacuumizer. Coolant inlet and outlet channels are positioned inside hollow shaft. At least one magnetron sprayer is positioned on vacuumizer walls and oriented toward outer surface of substrate moving device. Internal cavity of substrate moving device is configured so as to place coolant immediately at cylindrical wall of said device. Substrate moving device is electrically isolated from vacuumizer. Apparatus is equipped with device for changing potential difference between substrate moving device and vacuumizer. Hollow shaft and vacuumizer hermetically joining device is provided with heater. EFFECT: increased efficiency and provision for deposition of coatings at low temperatures. 5 cl, 1 dwg