FIELD: erasing mode in flash-memory array. SUBSTANCE: flash-memory array device has plurality of memory location transistors; means for feeding first voltage to control gate of at least one erasable memory location transistor; means for feeding second voltage more positive than first one to control gates of all transistors of mentioned memory locations other than at least one transistor of mentioned erasable memory location; means for feeding third voltage more positive than mentioned second one to drain of at least one mentioned transistor of mentioned erasable memory location and to drains of mentioned transistors of non-erasable memory locations. Operating process of mentioned device is given in description of invention. EFFECT: greatly reduced excitation at memory locations not chosen for erasing in erasing chosen ones. 14 cl, 4 dwg
Title | Year | Author | Number |
---|---|---|---|
INTERNALLY UPDATED FLUSHING MEMORY MATRIX | 1999 |
|
RU2224303C2 |
SEMICONDUCTOR UNBREAKABLE MEMORY UNIT | 1992 |
|
RU2097842C1 |
SEMICONDUCTOR MEMORY DEVICE | 1999 |
|
RU2249262C2 |
ELECTRICALLY ERASABLE AND PROGRAMMABLE NONVOLATILE STORAGE CELL | 1996 |
|
RU2168242C2 |
MEMORY DEVICE AND ITS MANUFACTURING PROCESS | 2001 |
|
RU2247441C2 |
CONTROL CIRCUIT FOR NONVOLATILE MEMORY DEVICE | 1998 |
|
RU2221286C2 |
PERMANENT STORAGE | 1990 |
|
RU2089943C1 |
RANDOM-ACCESS MEMORY CELL | 2024 |
|
RU2826859C1 |
MEMORY REGISTER OF NON-VOLATILE MEMORY UNIT AND METHOD FOR ITS PROGRAMMING | 1996 |
|
RU2111556C1 |
HIGH-INTEGRATION SEMICONDUCTOR STORAGE DEVICE AND ITS MANUFACTURING PROCESS | 1996 |
|
RU2153210C2 |
Authors
Dates
2004-01-20—Published
1999-03-12—Filed