FIELD: microelectronics, nanotechnology, and optoelectronics. SUBSTANCE: thin-film nanocrystal silicon doped with rhodium atoms until dopant-induced state is attained in forbidden gap of nanocrystal silicon with energies of 0.353 to 0.591 eV from bottom of silicon conductive region makes it possible to produce high-frequency oscillations of electrical or optical signals at frequency higher than 1013 Hz in electromagnetic field when voltage is applied. EFFECT: enhanced speed, facilitated manufacture. 1 cl, 4 dwg
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Authors
Dates
2004-03-27—Published
2001-12-05—Filed