FIELD: semiconductor and electronic devices with quantum potential wells; microelectronics, nanotechnology, and optoelectronics.
SUBSTANCE: oxidized thin-film nanocrystalline silicon that has impurity level in forbidden gap with energy of 0.14 eV from bottom of silicon conductivity gap enables generation of high-frequency oscillations of electrical or optical signals at frequency higher than 34 GHz.
EFFECT: enhanced speed, facilitated manufacture.
1 cl, 2 dwg
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Authors
Dates
2006-01-27—Published
2003-02-27—Filed