METHOD FOR PRODUCING GAS-PENETRABLE MEMBRANE AND GAS-PENETRABLE MEMBRANE Russian patent published in 2006 - IPC B01D67/00 B01D71/02 H01L21/3063 C25F3/12 

FIELD: technology for producing semi-penetrable membranes for molecular filtration of gas flows and for division of reaction spaces in chemical reactors.

SUBSTANCE: method for producing gas-penetrable membrane includes two-sided electro-chemical etching of monocrystalline plate made of composition A^IIIB^V of n conductivity type or of semiconductor A^IV with width of forbidden zone E≥1,0 electron volts and alloying level 10¹⁷-10²⁰ 1/cm³. Modes of aforementioned etching are set, providing for generation of simultaneously porous layers, while etching process is performed until moment of spontaneous stopping of electro-chemical process and generation of solid separating layer of stationary thickness on given part of plate area, determined using sharp bend on the curve of temporal dependence of anode current.

EFFECT: gas membrane, produced in accordance to method, has increased penetrability for molecules of light gases and increased selectivity characteristics at room temperature.

2 cl, 3 dwg, 3 ex