FIELD: semiconductor devices.
SUBSTANCE: proposed semiconductor ionizing-radiation coordinate detector has n+ substrate, n- or p- active layer epitaxially grown thereon with p+ flat signal electrodes formed on its surface and provided with ohmic contacts separated by grooves. The latter are etched through depth of 20 to 50% of active layer thickness and p+ layers of thickness constituting maximum 3% of active-layer thickness are formed on groove bottoms.
EFFECT: enlarged effective area of separate detector channels, reduced channel-to-channel current leakage, minimized spatial pitch of detector.
1 cl, 1 dwg, 1 ex
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Authors
Dates
2007-09-20—Published
2006-04-17—Filed