FIELD: ionizing radiation detectors.
SUBSTANCE: proposed ionizing radiation detector has GaAs substrate with contacts, its boundary semi-insulated layer, and ohmic contact. In addition it has Ga1 - xAlxAs insulating layer having common boundary with semi-insulating GaAs layer, non-doped GsAs layer having common boundary with Ga1 - xAlxAs insulating layer, GsAs doping layer of n polarity of conductivity having common boundary with non-doped GaAs layer that carries additional ohmic and barrier contacts. All these layers and above-mentioned ohmic contact form field-effect transistor incorporating p region formed in doped and non-doped GaAs layers and in GaAlAd insulating layer, as well as high-resistance region disposed on periphery of mentioned transistor.
EFFECT: enhanced threshold sensitivity and resolving power, reduced noise level, ability of detecting weak ionizing streams.
1 cl, 1 dwg
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Authors
Dates
2007-09-27—Published
2006-04-24—Filed