FIELD: semiconductor voltage limiters; surge protection of electronic devices and manufacture of mentioned devices.
SUBSTANCE: proposed high-voltage semiconductor potential limiter affords breakdown voltage of 40 to 40 000 V at reverse current of 10 to 10 000 A and has silicon substrate carrying at least one substrate-insulating layer and 0.1 - 10 μm thick layer of silicon-containing polycrystalline material, both sequentially formed on its surface; polycrystalline layer has alternating series-interconnected p-n+-p-n+ through p or n+-p- n+ through p, or p-n+ through p-n+ regions obtained by doping mentioned layer throughout entire thickness to dope concentration of minimum 1 x 1016 and 5 x 1016 cm-3, respectively, in p and n+ regions; contacts are connected to extreme regions of limiter. Two alternatives of claimed invention are proposed.
EFFECT: ability of dispensing with expensive monocrystalline materials, facilitated manufacture.
9 cl, 4 dwg
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Authors
Dates
2008-02-27—Published
2006-01-11—Filed