METHOD OF DEFINING OF OPTIMAL CONDITIONS FOR POLISHING Russian patent published in 2008 - IPC B24B1/00 

Abstract RU 2323813 C2

FIELD: production methods.

SUBSTANCE: it is done the preliminary polishing of the processing detail and done the physical-mathematical analysis. With the result of the analysis it is changed the polishing conditions from elemental contain of the detail surface layer, its stage condition and macrostructure. The mentioned parameters are defined by analysis of microdevice complex. It is includes the realization of x-ray stage analysis and slicing angel, x-ray photo-electrical spectroscope, mass-spectrometer and secondary ions with each layer analysis. At the same it is done the dimension of the micro-hardiness and roughness of processing surface.

EFFECT: it is increased the quality of processing surface.

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RU 2 323 813 C2

Authors

Efremov Vladimir Vladimirovich

Gedz' Andrej Dzhonovich

Pshenichkin Nikolaj Ivanovich

Kobernichenko Anatolij Borisovich

Gelevskij Roman Vladimirovich

Dates

2008-05-10Published

2003-05-05Filed