FIELD: electronics; semiconductor devices.
SUBSTANCE: indium antimonide photodiode includes n-type indium antimonide substrate with р-n junction formed in it, protective and passivating dielectric films, and contact system. Doping concentration in the substrate is 1016-3·1016 cm-3 The invention provides for increase of limit operating temperature of photodiode while keeping unchanged its threshold parameters, which makes considerably lower requirements to photodiode cooling system.
EFFECT: reduction of power consumption and improvement of weight and size parameters.
1 tbl, 3 dwg
Title | Year | Author | Number |
---|---|---|---|
PLANAR PHOTODIODE ON INDIUM ANTIMONIDE | 2011 |
|
RU2461914C1 |
METHOD OF PRODUCING PHOTODIODES ON CRYSTALS OF INDIUM ANTIMONID OF n-TYPE CONDUCTIVITY | 2007 |
|
RU2331950C1 |
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RU2313853C1 |
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RU2792707C1 |
METHOD FOR MANUFACTURING P-N-JUNCTIONS ON CRYSTALS OF INDIUM ANTIMONIDE HAVING N-TYPE CONDUCTANCE | 1993 |
|
RU2056671C1 |
MAGNETIC FIELD SENSOR | 2001 |
|
RU2238571C2 |
STRUCTURE PHOTOSENSITIVE TO INFRARED RADIATION AND METHOD FOR ITS MANUFACTURE | 2021 |
|
RU2769232C1 |
METHOD FOR PRODUCING HYBRID PHOTODIODE ARRAY AROUND INDIUM ANTIMONIDE | 1994 |
|
RU2069028C1 |
AVALANCHE PHOTODETECTOR | 2016 |
|
RU2641620C1 |
Authors
Dates
2008-05-10—Published
2006-10-26—Filed