FIELD: electronics; semiconductor devices.
SUBSTANCE: indium antimonide photodiode includes n-type indium antimonide substrate with р-n junction formed in it, protective and passivating dielectric films, and contact system. Doping concentration in the substrate is 1016-3·1016 cm-3 The invention provides for increase of limit operating temperature of photodiode while keeping unchanged its threshold parameters, which makes considerably lower requirements to photodiode cooling system.
EFFECT: reduction of power consumption and improvement of weight and size parameters.
1 tbl, 3 dwg
| Title | Year | Author | Number | 
|---|---|---|---|
| PLANAR PHOTODIODE ON INDIUM ANTIMONIDE | 2011 | 
 | RU2461914C1 | 
| METHOD OF PRODUCING PHOTODIODES ON CRYSTALS OF INDIUM ANTIMONID OF n-TYPE CONDUCTIVITY | 2007 | 
 | RU2331950C1 | 
| METHOD FOR PRODUCING PHOTODIODES ON INDIUM ANTIMONIDE | 2006 | 
 | RU2313853C1 | 
| METHOD FOR PRODUCING PHOTODIODES ON INDIUM ANTIMONIDE | 2006 | 
 | RU2313854C1 | 
| METHOD FOR MANUFACTURING A MATRIX PHOTODETECTOR | 2022 | 
 | RU2792707C1 | 
| METHOD FOR MANUFACTURING P-N-JUNCTIONS ON CRYSTALS OF INDIUM ANTIMONIDE HAVING N-TYPE CONDUCTANCE | 1993 | 
 | RU2056671C1 | 
| METHOD OF MAKING PHOTODIODE ARRAY | 2024 | 
 | RU2840363C1 | 
| MAGNETIC FIELD SENSOR | 2001 | 
 | RU2238571C2 | 
| STRUCTURE PHOTOSENSITIVE TO INFRARED RADIATION AND METHOD FOR ITS MANUFACTURE | 2021 | 
 | RU2769232C1 | 
| METHOD FOR PRODUCING HYBRID PHOTODIODE ARRAY AROUND INDIUM ANTIMONIDE | 1994 | 
 | RU2069028C1 | 
Authors
Dates
2008-05-10—Published
2006-10-26—Filed