FIELD: technological processes.
SUBSTANCE: onto solid acetate substrate extruded on supporting copper mesh, metal layer is sputtered, above which layer of material is sputtered with lower coefficient of sputtering, acetate substrate is removed, and ion etching of prepared double-layer film is carried out until top layer is removed, and nano-openings are created in metal layer. As a result, metal membrane is produced with average radius of openings of 28.98 nm and density of openings of -23.6-106 1/mm3.
EFFECT: production of nanosize metal membranes with openings from 5 to 100 nm.
7 cl, 3 dwg
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