FIELD: process engineering.
SUBSTANCE: invention relates to nanotechnologies, particularly, to production of nanomembrane filters with nanosized orifices to be used as superfine fluid and gas cleaning filters, or for selective filtration of definite-size atoms, or in biotechnologies for virus concentration and separation. For producing nanosized orifices island structure of fine metal films is used that originates on initial stage of deposition unless film thickness exceeds 5-10 nm, while piercing nanosized orifices is performed by breakdown electric current in depth of laminar structure across metal islands.
EFFECT: production of nanomembrane filters of larger area, higher selectivity, mechanical strength and resistance to high temperatures and chemicals.
1 dwg
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Authors
Dates
2011-05-20—Published
2009-11-19—Filed