METHOD OF PRODUCING METAL FILMS WITH GIVEN SHAPE Russian patent published in 2016 - IPC B05D1/00 

Abstract RU 2597373 C1

FIELD: electronics.

SUBSTANCE: invention relates to electron-beam technology and can be used in optics, photonics, integral optics, nanoplasmonics and electronics. Method of producing metal films of specified shape consists in that, on a substrate with high electric resistance a metal film is applied with thickness of 50-100 nm, irradiated by a scanning electron beam with energy of electrons 3-10 keV, a dose of 20-100 mC/cm2 and chemical etching of metal film to its disappearance at portions of substrate not irradiated with electrons.

EFFECT: advantage of method is that metal films of specified shape can be made on any dielectric or semiconductor substrates or films with high electric resistance, as well as chemical-resistant polymers.

1 cl, 5 dwg

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RU 2 597 373 C1

Authors

Prosnikov Mikhail Alekseevich

Nikonorov Nikolaj Valentinovich

Sidorov Aleksandr Ivanovich

Golubok Aleksandr Olegovich

Komissarenko Filipp Eduardovich

Mukhin Ivan Sergeevich

Dates

2016-09-10Published

2015-04-29Filed