METHOD OF PRODUCING NANO ORIFICES Russian patent published in 2011 - IPC B01D67/00 B82B3/00 

Abstract RU 2427415 C1

FIELD: process engineering.

SUBSTANCE: invention relates to nanotechnologies, particularly, to production of nano orifices, films with nano pores etc. For producing nanosized orifices island structure of fine metal films is used that originates on initial stage of deposition unless film thickness exceeds 2-15 nm, while piercing nanosized orifices is performed by breakdown electric current in depth of laminar structure across metal islands. Island size is unambiguously defined by evaporated film thickness.

EFFECT: hard structure with preset-size nano holes.

2 cl, 1 dwg

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RU 2 427 415 C1

Authors

Suchkov Sergej Germanovich

Zaporotskova Irina Vladimirovna

Vasil'Kovskij Sergej Vladimirovich

Suchkov Dmitrij Sergeevich

Selifonov Anton Viktorovich

Dates

2011-08-27Published

2010-01-25Filed