FIELD: process engineering.
SUBSTANCE: invention relates to nanotechnologies, particularly, to production of nano orifices, films with nano pores etc. For producing nanosized orifices island structure of fine metal films is used that originates on initial stage of deposition unless film thickness exceeds 2-15 nm, while piercing nanosized orifices is performed by breakdown electric current in depth of laminar structure across metal islands. Island size is unambiguously defined by evaporated film thickness.
EFFECT: hard structure with preset-size nano holes.
2 cl, 1 dwg
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Authors
Dates
2011-08-27—Published
2010-01-25—Filed