FIELD: metallurgy, crystal growing.
SUBSTANCE: invention refers to semi-conductor technology of AIIIBV type compositions. The method is implemented by means of bombarding mono-crystalline plates of arsenide-indium with fast neutrons with following heating, annealing and cooling. The mono-crystalline plates are subject to bombardment with various degree of compensation at density of flow not more, than 1012 cm-2 c-1 till fluence F=(0.5÷5.0)·1015 cm-2 , while annealing is carried out at 850÷900°C during 20 minutes at the rate of heating and cooling 10 deg/min and 5 deg/min correspondingly.
EFFECT: production of arsenide-iridium plate with upgraded uniformity and thermal-stability of electro-physical characteristics and with decreased degree of compensation.
2 ex, 1 tbl
Title | Year | Author | Number |
---|---|---|---|
METHOD OF PRODUCING SEMI-INSULATING GALLIUM ARSENIDE | 1992 |
|
RU2046164C1 |
PRODUCTION METHOD OF TIN-DOPED INDIUM PHOSPHIDE MONOCRYSTALS | 2006 |
|
RU2344510C2 |
METHOD OF PRODUCING MONO-CRYSTALS OF INDIUM ANTIMONIDE ALLOYED WITH TIN | 2006 |
|
RU2344209C2 |
METHOD OF PROCESSING MONOCRYSTALLINE EPITAXIAL LAYERS OF GROUP III NITRIDES | 2006 |
|
RU2354000C2 |
DOPING TECHNIQUE OF EPITAXIAL NITRIDE LAYERS OF GALLIUM BY GERMANIUM | 2006 |
|
RU2354001C2 |
METHOD OF MEASURING FLUENCE OF SLOW NEUTRONS USING MONOCRYSTALLINE SILICON | 2011 |
|
RU2472181C1 |
METHOD OF MEASURING FAST NEUTRON FLUENCE WITH SEMICONDUCTOR MONOCRYSTALLINE DETECTOR | 2013 |
|
RU2523611C1 |
METHOD OF DETERMINATION OF CONTENT OF IMPURITY IN CRYSTALLINE SILICON | 1991 |
|
RU2013821C1 |
METHOD FOR PRODUCTION OF INDIUM AMMONIDE LARGE-SIZE MONOCRYSTALS | 2012 |
|
RU2482228C1 |
METHOD OF PRODUCTION OF RESISTIVE SILICON | 2002 |
|
RU2202655C1 |
Authors
Dates
2009-01-20—Published
2006-11-17—Filed