FIELD: physics.
SUBSTANCE: in general case, proposed generator comprises source of exposing X-ray radiation, radiolucent shutter-interrupter to control exposing beam, coordinate table to support processed substrate and set of diaphragms to set light spot sizes. Proposed set of diaphragms is made up of two X-ray templates with radiolucent round or slit-shaped orifices with sizes made with preset spacing. Above design allows fast formation of topology of resistive mask in thick layer of X-ray resist to sub micrometer accuracy.
EFFECT: higher accuracy of formation of resistive mask topology using X-ray beam generator.
1 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD OF SCREEN-X-RAY LITHOGRAPHY | 2007 |
|
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|
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| X-RAY LITHOGRAPHIC TEMPLATE AND METHOD FOR ITS PRODUCTION | 2007 |
|
RU2339067C1 |
| METHOD FOR MANUFACTURE OF LITOGRAPHIC MASK FOR LIGA-TECHNOLOGY | 2007 |
|
RU2350996C1 |
| METHOD OF SCREEN SCANNING SYNCHROTRON X-RAY LITHOGRAPHY | 2007 |
|
RU2344454C1 |
| X-RAY LITHOGRAPHIC TEMPLATE AND METHOD FOR PRODUCTION THEREOF | 2010 |
|
RU2469369C2 |
