METHOD OF SCREEN-X-RAY LITHOGRAPHY Russian patent published in 2009 - IPC G03F7/00 

FIELD: physics.

SUBSTANCE: X-ray mask locked in mask holder and comprising a topological image generated on its working surface and the substrate to be processed locked in its holder and furnished with an X-ray resistor layer applied on its surface are arranged on the path of exposing radiation. Note here that the X-ray screen is arranged closer to the said radiation source. Mind that all processes of producing X-ray mask are executed at a temperature equal to that of the aforesaid mask inside the lithographic station working chamber during exposure. Note also that prior to exposure, the X-ray mask total surface area is uniformly warmed up electro thermally and by subjecting it to warm-up radiation till preset temperature, the said radiation not generating additional exposure dose in the aforesaid X-ray-resistor. Then the aforesaid temperature is kept up with the help of the aforesaid means during the entire period of the X-ray mask staying in the lithographic station working chamber.

EFFECT: reduced deformation distortions of X-ray mask topological image in exposure.

5 dwg