FIELD: machine building.
SUBSTANCE: invention is related to device for film formation and may find application in different fields of machine building. In chamber (2) for film formation, pressure in which is controlled, during rotation of rotary drum (7) with drive from driving motor (8), film is formed on upper surface of substrate (12). Substrate is located on tray (13) and is held with holder in it (10). Film is formed on external surface of substrate by means of cathodes (17a and 17b), to which DC or AC voltage is applied, or high frequency voltage. Film is also formed on internal surface of substrate (12) by means of cathodes (14a and 14b), to which DC or AC voltage is applied, or high frequency voltage. As a result high quality film is formed continuously and with high efficiency by means of sputtering on both surfaces of substrate by means of substrate temperature rising control to previously specified value or higher.
EFFECT: creation of high quality film on both surfaces of substrate continuously and with high efficiency.
13 cl, 5 dwg
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