FIELD: physics, atomic power.
SUBSTANCE: invention relates to an atomic layer deposition apparatus and a method of loading said apparatus. The apparatus comprises ALD reactors, each configured to receive a batch of substrates for ALD treatment and includes a reaction chamber with top loading, a system of covers, a hoisting device for hoisting the system of covers for loading the reaction chamber and a loading robot. The loading robot has a gripping part and a movement device, wherein the loading robot is configured to perform multiple loading operations for loading each of the ALD reactors. Each loading operation includes gripping the gripping part in a zone or on a storage shelf of a substrate holder in the batch of substrates, the movement device moving the substrate holder with the batch of substrates into the reaction chamber of the corresponding ALD reactor and lowering said substrate holder vertically from the top into the corresponding reaction chamber.
EFFECT: improved automation of the apparatus and efficiency thereof.
15 cl, 6 dwg
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