METHOD OF RECEIVIGN OF NANOSTRUCTURED FILM COATINGS (OPTIONS) Russian patent published in 2009 - IPC C23C14/24 C23C14/48 B82B3/00 

FIELD: metallurgy.

SUBSTANCE: invention relates to vacuum ion-plasma technology, used for modification of products' surfaces and can be used in machines-, instrument making and other fields. For substratum it is implemented plasma application in vacuum of nanostructured film coating at temperature, less than 0.3T_f of substratum material. Application of coating laser is implemented at switching on of one or several plasma source up to thickness L, corresponding L < Rc + ΔRc, where Rc - mean depth of space power distribution, extracted at elastic events of atoms in coating, nm, ΔRc - 0.5 of lateral dimension of impact series of atoms in coating, nm, irradiation of coating layer by high-energy ions beam of implanter up to radiation dose φ > δ²/k·(F_D)_ef, 1/nm², where: δ - thickness of mixed substratum layer and applied coating, equal to 1nm, (F_D)_ef, = (F_Dc+F_Ds)/2, F_Dc -energy, extracted at elastic event of atoms in layer, F_Ds - energy, extracted at elastic event of atoms in substratum , k=0.6·10^-4 nm⁵eV^-1, and following plasma spraying of layers up to receiving of coating of required thickness. At application of multiple coating specified procedures are implemented in one vacuum volume, and substratum is repeatedly moved from plasma source to implanter. Plasma spraying of coating layer can be implemented at switching on of one or several plasma source of coating layer with simultaneous and persistent irradiation by high-energy ion beams of implanter. There are applied nanostructured coatings with high adhesion for one working chamber charging, that exceeds productivity of process.

EFFECT: development of effective application method of nanostructured film coatings.

3 cl, 5 ex