FIELD: physics.
SUBSTANCE: invention relates to micro- and nanoelectronics, and specifically to memory devices made using micro- and nano-electronic methods. The memory cell includes two electrodes with a dielectric layer placed between them. The dielectric layer has defects which provide electrical conduction by tunneling carriers in the defects, and contains semiconductor material impurities near one of the electrodes which provide for acquisition, storage and removal of electric charge, which blocks current from flowing in the defects of the dielectric layer.
EFFECT: design of a two-electrode nonvolatile reprogrammable memory cell with reproducible parametres, using the effect of electrical charge storage.
6 dwg
Title | Year | Author | Number |
---|---|---|---|
METHOD OF PRODUCTION OF DIELECTRIC LAYER OF MIS STRUCTURES HAVING EFFECT OF CONDUCTIVITY SWITCHING | 2012 |
|
RU2529442C2 |
CELL OF NONVOLATILE ELECTRICALLY PROGRAMMABLE MEMORY | 2010 |
|
RU2436190C1 |
STRUCTURE OF DIELECTRIC LAYER FOR MIS STRUCTURES HAVING CONDUCTIVITY SWITCHING EFFECT | 2013 |
|
RU2563553C2 |
PERMANENT MEMORY ELEMENT BASED ON CONDUCTIVE GETE FERROELECTRIC | 2022 |
|
RU2785593C1 |
TUNNEL UNALLOYED MULTI-SHEAR FIELD NANOTRANSISTOR WITH CONTACTS OF SCHOTTKY | 2016 |
|
RU2626392C1 |
NONVOLATILE MEMORY MATRIX LOCATION | 2005 |
|
RU2302058C2 |
RANDOM-ACCESS MEMORY CELL | 2024 |
|
RU2826859C1 |
MEMORY ALLOY LOCATION | 2004 |
|
RU2263373C1 |
METHOD OF DETERMINING ELECTROPHYSICAL PARAMETERS OF CAPACITOR STRUCTURE OF MEMRISTOR CHARACTERISING MOULDING PROCESS | 2015 |
|
RU2585963C1 |
MEMORY DEVICE WITH DIELECTRIC LAYER BASED ON DIELECTRIC FILMS AND METHOD OF ITS PRODUCING | 2006 |
|
RU2343587C2 |
Authors
Dates
2009-12-20—Published
2007-07-23—Filed