MEMORY CELL WITH CONDUCTING LAYER-DIELECTRIC-CONDUCTING LAYER STRUCTURE Russian patent published in 2009 - IPC H01L27/105 B82B1/00 

Abstract RU 2376677 C2

FIELD: physics.

SUBSTANCE: invention relates to micro- and nanoelectronics, and specifically to memory devices made using micro- and nano-electronic methods. The memory cell includes two electrodes with a dielectric layer placed between them. The dielectric layer has defects which provide electrical conduction by tunneling carriers in the defects, and contains semiconductor material impurities near one of the electrodes which provide for acquisition, storage and removal of electric charge, which blocks current from flowing in the defects of the dielectric layer.

EFFECT: design of a two-electrode nonvolatile reprogrammable memory cell with reproducible parametres, using the effect of electrical charge storage.

6 dwg

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RU 2 376 677 C2

Authors

Orlikovskij Aleksandr Aleksandrovich

Berdnikov Arkadij Evgen'Evich

Mironenko Aleksandr Aleksandrovich

Popov Aleksandr Afanas'Evich

Chernomordik Vladimir Dmitrievich

Dates

2009-12-20Published

2007-07-23Filed