METHOD OF SEMICONDUCTOR STRUCTURE FORMATION Russian patent published in 2010 - IPC H01L21/76 

Abstract RU 2393585 C1

FIELD: electricity.

SUBSTANCE: method of semiconductor structure formation involves cultivation of epitaxial layer on original plate using source plate in the mode of chemical semiconductor transfer in halogen-containing hydrogen medium from plates to adjoining plates over a gap at minimum reactant flow or in still medium.

EFFECT: reduced cost of epitaxial structure manufacturing for integral schemes, discrete instruments, including solar cells.

3 cl, 4 dwg

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RU 2 393 585 C1

Authors

Volkov Andrej Fedotovich

Kozikhin Vladimir Viktorovich

Sokolov Evgenij Makarovich

Statsenko Vladimir Nikolaevich

Stepchenkov Viktor Nikolaevich

Shvarts Karl-Genrikh Markusovich

Dates

2010-06-27Published

2009-04-28Filed