FIELD: electricity.
SUBSTANCE: method of semiconductor structure formation involves cultivation of epitaxial layer on original plate using source plate in the mode of chemical semiconductor transfer in halogen-containing hydrogen medium from plates to adjoining plates over a gap at minimum reactant flow or in still medium.
EFFECT: reduced cost of epitaxial structure manufacturing for integral schemes, discrete instruments, including solar cells.
3 cl, 4 dwg
Title | Year | Author | Number |
---|---|---|---|
METHOD OF MANUFACTURING THE EPITAXIAL LAYER OF SILICON ON A DIELECTRIC SUBSTRATE | 2016 |
|
RU2618279C1 |
PRINTING FORM AND METHOD OF CHANGING ITS WETTABILITY PROPERTIES | 1999 |
|
RU2241600C2 |
METHOD FOR PRODUCTION OF TUNNELLING MULTI-GATE FIELD NANOTRANSISTOR WITH SCHOTTKY CONTACTS | 2018 |
|
RU2717157C2 |
SEMICONDUCTOR PHOTOELECTRIC GENERATOR AND METHOD OF MAKING SAID GENERATOR | 2009 |
|
RU2408111C2 |
METHOD OF MAKING PHOTOELECTRIC ELEMENT BASED ON GERMANIUM | 2008 |
|
RU2377698C1 |
METHOD FOR MANUFACTURING NANOHETEROSTRUCTURE CHIPS AND ETCHING MEDIUM | 2012 |
|
RU2485628C1 |
BORING OF MONOCRYSTAL SILICON PLATES | 2014 |
|
RU2569551C2 |
METHOD OF OBTAINING NANOSTRUCTURES OF SEMICONDUCTOR | 2008 |
|
RU2385835C1 |
METHOD FOR HETEROSTRUCTURE MANUFACTURE | 2006 |
|
RU2301476C1 |
TUNNEL FIELD-EFFECT NANOTRANSISTOR WITH INSULATED GATE | 2007 |
|
RU2354002C1 |
Authors
Dates
2010-06-27—Published
2009-04-28—Filed