FIELD: chemistry.
SUBSTANCE: the invention relates to production of polysilicon, in particular, to the reactor for chemical deposition of polysilicon from steam phase. = The reactor includes a support system fitted with supports for heating elements and the hull attached to the said support system, forming the deposition chamber. The device comprises at least one silicone heating element positioned in the chamber on the supports, and a power source connectable with both ends of the heating element through lead-ins in the support system, used to heat the heating element. The support system has a gas inlet connected with the silicon-containing gas source and a gas outlet. Furthermore, the heating element is U-shaped and has at least one tubular section with the outer diameter of at least 20 mm and the ratio of wall width to the outer diameter less than 1/4.
EFFECT: increased polysilicon production yield.
7 cl, 6 dwg
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