FIELD: chemistry.
SUBSTANCE: method of producing boron-silicon-containing nanoparticles involves feeding a gas mixture into a flow reactor, said mixture containing monosilane (SiH4) with a reagent 'B', and a buffer gas, inducing pyrolysis of the gas mixture using continuous radiation of a CO2-laser at pressure of the gas mixture in the reactor below atmospheric pressure. The reactant 'B' used is boron trichloride (BCl3); the process is carried out with gas flow rate ratio monosilane: reactant B: buffer gas equal to 1:(1.2-1.5):(45-55), with power density of the laser radiation of 6000-8000 W/cm2. Nanoparticles with boron content of 55-65 at % and silicon content being the balance is obtained.
EFFECT: nanoparticles are characterised by high content of boron.
4 cl, 4 dwg
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Authors
Dates
2012-09-10—Published
2011-06-21—Filed