METHOD OF MAKING BORON-SILICON-CONTAINING NANOPARTICLES Russian patent published in 2012 - IPC C01B35/00 C01B33/00 B82B3/00 

FIELD: chemistry.

SUBSTANCE: method of producing boron-silicon-containing nanoparticles involves feeding a gas mixture into a flow reactor, said mixture containing monosilane (SiH₄) with a reagent 'B', and a buffer gas, inducing pyrolysis of the gas mixture using continuous radiation of a CO₂-laser at pressure of the gas mixture in the reactor below atmospheric pressure. The reactant 'B' used is boron trichloride (BCl₃); the process is carried out with gas flow rate ratio monosilane: reactant B: buffer gas equal to 1:(1.2-1.5):(45-55), with power density of the laser radiation of 6000-8000 W/cm². Nanoparticles with boron content of 55-65 at % and silicon content being the balance is obtained.

EFFECT: nanoparticles are characterised by high content of boron.

4 cl, 4 dwg