FIELD: physics.
SUBSTANCE: method of levelling a magnetic film during deposition thereof is disclosed. The method involves applying a first magnetic field along a first direction in a region in which a substrate is located when depositing a first magnetic material onto the substrate, wherein the magnetic film contains the first magnetic material, and applying a second magnetic field along a second direction in the region when depositing the first magnetic material onto the substrate. Three versions of apparatus for depositing the magnetic film are also disclosed.
EFFECT: increasing efficiency of magnetic random access memory by cutting power consumption or increasing reliability, with reduction of the size of the elements.
25 cl, 7 dwg
