FIELD: metallurgy.
SUBSTANCE: at least one substrate is loaded into a vacuum chamber. The vacuum chamber is closed and exhausted. The substrate is cleaned by introduction of a gaseous reducing agent into the chamber. The substrate surface is increased by deposition of a vapour-like component on it, which is preferably identical to a substrate material. The coating is applied by the method selected from the group of processes of plasma hardening, physical deposition from a gas phase and processes of spraying, at the same time one or more metals or their oxides are applied onto the substrate surface. The chamber is filled with air, and the coated substrate is withdrawn from it.
EFFECT: method is characterised by simplicity, high efficiency and controllability of the process.
11 cl
| Title | Year | Author | Number |
|---|---|---|---|
| SUBSTRATE COATING, APPLIED ON ONE OR MORE SIDES | 2011 |
|
RU2574562C2 |
| METHOD OF CLEANING FOR COATING APPLICATION PLANTS | 2010 |
|
RU2554838C2 |
| DEVICE FOR DEPOSITION OF THE MULTILAYERED OPTICAL COATINGS | 2005 |
|
RU2312170C2 |
| METHOD FOR APPLYING METAL COATING FROM MATERIAL SUBJECT TO ACTIVE OXIDATION IN AIR ATMOSPHERE, AND DEVICE FOR ITS IMPLEMENTATION | 2021 |
|
RU2757882C1 |
| VACUUM PVD PLANT FOR APPLICATION OF COATINGS | 2008 |
|
RU2486280C2 |
| VACUUM UNIT FOR APPLICATION OF COATINGS | 2008 |
|
RU2471015C2 |
| DEVICE AND METHODS FOR ATOMIC LAYER DEPOSITION | 2016 |
|
RU2728189C1 |
| ATOMIC LAYER DEPOSITION (ALD) DEVICE | 2020 |
|
RU2752059C1 |
| PLASMA-IMMERSION ION TREATMENT AND DEPOSITION OF COATINGS FROM VAPOUR PHASE WITH HELP OF LOW-PRESSURE ARC DISCHARGE | 2014 |
|
RU2695685C2 |
| LOW PRESSURE ARC PLASMA IMMERSION COATING VAPOUR DEPOSITION AND ION TREATMENT | 2014 |
|
RU2662912C2 |
