FIELD: physics.
SUBSTANCE: invention relates to microelectronics. The method of making a niobium oxide-based diode involves forming a lower conducting electrode, a rectifying electrical junction and an upper conducting electrode. The rectifying electrical junction used is a 40-100 nm thick niobium oxide layer with an upper electrode which enables to form a Schottky barrier. The niobium oxide layer is obtained by oxidising the lower electrode which consists of niobium metal. The upper conducting electrode used is metals with a work function higher than 5.1 eV: Ni, Au, Pt, Pd.
EFFECT: invention reduces back current density and increases the ratio of direct to back current by up to seven orders and also enables to use simpler and cheaper low-temperature technology of producing oxide layers, which reduces the cost of making oxide-based diodes.
2 cl, 2 dwg
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Authors
Dates
2012-12-20—Published
2011-06-16—Filed