METHOD TO MANUFACTURE PROCESSED SURFACE AND VACUUM SOURCES OF PLASMA Russian patent published in 2013 - IPC H01J37/32 

Abstract RU 2479885 C2

FIELD: electricity.

SUBSTANCE: when processing surfaces of substrates or processed parts with the help of a vacuum plasma discharge between an anode (9) and a cathode (7) a solid substance (19) is formed and deposited on an anode surface (21), and this substance has a higher specific impedance by DC compared to the specific DC impedance of the anode material. At least parts of the anode surface are screened against such deposition by establishment of a screening plasma (25) onto them. There are also versions of vacuum sources of plasma disclosed, which implement the proposed method.

EFFECT: expansion of plasma source functional capabilities.

36 cl, 16 dwg

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RU 2 479 885 C2

Authors

Ramm Jurgen

Vidrig Beno

Kurapov Denis

Dates

2013-04-20Published

2007-11-01Filed