METHOD OF PRODUCING INDIUM MICROCONTACTS USING POSITIVE REVERSIBLE PHOTORESIST Russian patent published in 2014 - IPC H01L21/441 

FIELD: physics.

SUBSTANCE: semiconductor plate with metal pads for forming indium microcontacts is coated with a layer of positive reversible photoresist which, after exposure through a photomask with a pattern of the microcontacts, is subjected to special heat treatment (image reversal), followed by blanket exposure and development; an indium layer is sprayed onto the obtained negative-profile photoresist mask; the photoresist layer is then dissolved with simultaneous peeling of the indium layer in the gaps between microcontacts (explosion process), leaving the latter on the metal pads.

EFFECT: simple technique and shorter time for making indium microcontacts by lift-off photolithography.

6 dwg