FIELD: physics, optics.
SUBSTANCE: invention relates to semiconductor light-emitting devices. The structure includes a III-nitride semiconductor structure comprising a light-emitting region located between an n-type region and a p-type region, wherein at least one layer in the light-emitting region is a Bx(InyGa1-y)1-xN light-emitting layer, 0.06≤x≤0.08 and 0.1≤y≤0.14, having a band gap energy and a bulk lattice constant corresponding to a lattice constant of a relaxed layer having the same composition as the Bx(InyGa1-y)1-xN light-emitting layer; an InGaN layer having the same band gap energy as the Bx(InyGa1-y)1-xN layer, has a bulk lattice constant corresponding to a lattice constant of a relaxed layer having the same composition as the InGaN layer; and the bulk lattice constant of the Bx(InyGa1-y)1-xN layer is less than the bulk lattice constant of the InGaN layer.
EFFECT: invention provides a III-nitride semiconductor structure, where at least one layer in the light-emitting region contains boron.
16 cl, 8 dwg
Authors
Dates
2014-07-20—Published
2010-02-04—Filed