Show metadata Hide metadata

(19)

(11)

2 534 444

(13)

(51)

IPC

H01L21/306(2006-01-01)

(21) (22)

Application

2013109843/28, 2013-03-05

(24)

Start date

2013-03-05

(22)

Actual filing date

2013-03-05

(45)

Published

2014-11-27

(72)

Inventor

Ismailov Tagir AbdurashidovichShakhmaeva Ajshat RasulovnaZakharova Patimat Rasulovna

(73)

Holder

Federal'Noe Gosudarstvennoe Bjudzhetnoe Obrazovatel'Noe Uchrezhdenie Vysshego Professional'Nogo Obrazovanija Gosudarstvennyj Tekhnicheskij Universitet"

METHOD OF REMOVING OXIDE FROM SILICON PLATE SURFACE Russian patent published in 2014 - IPC H01L21/306

Abstract RU 2534444 C2

FIELD: chemistry.

SUBSTANCE: in a method of processing silicon plates before sputtering the removal of oxide from the surface of the silicon plates is performed in a solution, which contains ammonium bifluoride (NH₄HF₂) and de-ionised water (H₂O) in a ratio of NH₄HF₂:H₂O=1:26, with the time of processing constituting not more than 10 seconds at room temperature.

EFFECT: complete removal of oxide residues from the surface of silicon plates, reduction of the processing time and reduction of the process cost.

Similar patents RU2534444C2

Title	Year	Author	Number
PROCESSING PLATE SURFACE FOR FABRICATION OF SOLAR CELLS	2014	Ismailov Tagir Abdurashidovich Shakhmaeva Ajshat Rasulovna Shangereeva Bijke Alievna Zakharova Patimat Rasulovna Litovchenko Mariya Nikolaevna Murtuzaliev Azamat Ibragimovich	RU2586266C2
METHOD FOR TREATMENT BEFORE SPRAYING OF TITANIUM-GERMANIUM (Ti-Ge)	2020	Ismailov Tagir Abdurashidovich Shangereeva Bijke Alievna Shakhmaeva Ajshat Rasulovna Kazalieva Elmira	RU2786369C2
METHOD OF CLEANING CARBIDE-SILICON PIPE	2013	Ismailov Tagir Abdurashidovich Shakhmaeva Ajshat Rasulovna Zakharova Patimat Rasulovna	RU2534388C2
METHOD OF QUARTZ PIPE CLEANING	2013	Ismailov Tagir Abdurashidovich Shakhmaeva Ajshat Rasulovna Zakharova Patimat Rasulovna	RU2534446C2
METHOD OF PROCESSING SUBSTRATES IN LIQUID ETCHING AGENT	2009	Ismailov Tagir Abdurashidovich Sarkarov Tadzhidin Ehkberovich Shangereeva Bijke Alievna Shakhmaeva Ajshat Rasulovna	RU2419175C2
METHOD OF TREATING SILICON EQUIPMENT	2008	Ismailov Tagir Abdurashidovich Shangereeva Bijke Alievna Shakhmaeva Ajshat Rasulovna	RU2383965C1
METHOD OF PROCESSING SILICON CRYSTALS	2008	Ismailov Tagir Abdurashidovich Shakhmaeva Ajshat Rasulovna Shangereeva Bijke Alievna	RU2376676C1
METHODS FOR TREATMENT OF PLATE SURFACE PRIOR TO APPLICATION OF POLYIMIDE	2008	Shakhmaeva Ajshat Rasulovna Shangereeva Bijke Alievna	RU2359357C1
METHOD FOR DEEP CLEANING SURFACE OF SILICON WAFERS	2020	Pautkin Valerij Evgenevich Mishanin Aleksandr Evgenevich Krajnova Olga Mikhajlovna	RU2750315C1
METHOD FOR PRE-EPITAXIAL TREATMENT OF SURFACE OF GERMANIUM SUBSTRATE	2013	Belousov Viktor Sergeevich Illarionov Vladimir Viktorovich Lapshina Anastasija Anatol'Evna Spitsyna Nadezhda Nikanorovna Chebotarev Jurij Alekseevich Chebotareva Anna Alekseevna	RU2537743C1

RU 2 534 444 C2

Authors

Ismailov Tagir Abdurashidovich

Shakhmaeva Ajshat Rasulovna

Zakharova Patimat Rasulovna

Dates

2014-11-27—Published

2013-03-05—Filed