CONTROL AND STABILISATION OF POST DIFFUSION (ANTINOMY DIFFUSION) COOLING OF LOW-VOLTAGE (~6 V) SILICON PLANAR STRUCTURES OF VRD AND DEVICE TO THIS END Russian patent published in 2015 - IPC H01L21/22 

Abstract RU 2538027 C2

FIELD: process engineering.

SUBSTANCE: invention relates to solid-state microelectronics, particularly, to making of p-n-junctions in silicon by "sealed tube" tube, that is, evacuated sealed quartz ampoule. Here, after high-temperature diffusion annealing of said ampoule it is subjected to forced cooling by definite amount of water kept at definite temperature.

EFFECT: reproducible conditions of breakdown voltages in LV p-n-junctions, hence, higher yield of devices.

3 cl, 6 dwg

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RU 2 538 027 C2

Authors

Glukhov Aleksandr Viktorovich

Skornjakov Stanislav Petrovich

Perov Gennadij Vasil'Evich

Maslovskij Viktor Mikhajlovich

Rakhmatov Akhmad Zajnidinovich

Dates

2015-01-10Published

2012-05-28Filed