METHOD OF MAKING SILICON SENSITIVE ELEMENT FOR LUMINESCENT OXYGEN NANOSENSOR Russian patent published in 2015 - IPC H01L21/20 B82B3/00 

Abstract RU 2539120 C1

FIELD: chemistry.

SUBSTANCE: method of making a silicon sensitive element for a luminescent oxygen sensor includes growing, on a substrate of monocrystalline silicon of p-type conductivity with surface crystallographic orientation (100) with resistivity of 1 to 10 mOm·cm, a layer of porous silicon nanofilaments by successively holding in the following solutions: first in an aqueous silver nitrate solution with concentration of 0.02-0.04 mol/l and hydrofluoric acid with concentration of 5 mol/l in ratio of 1:1 for 30-60 s to deposit silver nanoparticles on the surface of a silicon plate, then in a mixture of hydrofluoric acid with concentration of 5 mol/l and 30% hydrogen peroxide in ratio of 10:1 for 20-60 min to form silicon nanofilaments as a result of chemical etching of the silicon plate in places coated with silver nanoparticles, and finally in 65% nitric acid solution for 10-20 min to remove silver nanoparticles and stabilise the surface of the silicon nanofilaments, thereby obtaining porous silicon nanofilaments with length of 2-5 mcm, cross-sectional dimension of 30-300 nm, having luminescence in the range of 650-850 nm, the intensity of which depends on the presence of oxygen molecules.

EFFECT: improved properties.

4 dwg

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RU 2 539 120 C1

Authors

Timoshenko Viktor Jur'Evich

Osminkina Ljubov' Andreevna

Gongal'Skij Maksim Broneslavovich

Gonchar Kirill Aleksandrovich

Marshov Vladimir Sergeevich

Georgobiani Veronika Aleksandrovna

Dates

2015-01-10Published

2013-07-01Filed