COATING LIQUID FOR FORMING THIN METAL OXIDE FILM, THIN METAL OXIDE FILM, FIELD-EFFECT TRANSISTOR AND METHOD OF MAKING FIELD-EFFECT TRANSISTOR Russian patent published in 2015 - IPC H01L21/336 H01L21/368 H01L29/786 

Abstract RU 2546725 C2

FIELD: chemistry.

SUBSTANCE: invention relates to thin metal-oxide films used to make a field-effect transistor. A coating liquid for forming a thin metal oxide film includes an inorganic indium compound, at least one of an inorganic magnesium compound and an inorganic zinc compound, glycolic ether and a diol, wherein the diol is selected from at least one of diethylene glycol, 1,2-propanediol and 1,3-butanediol.

EFFECT: invention enables to obtain a thin-film metal oxide coating with the required resistivity using a simple method, a large area, the required shape and with high accuracy.

12 cl, 10 dwg, 4 tbl

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RU 2 546 725 C2

Authors

Nakamura Juki

Ueda Naojuki

Abe Jukiko

Sone Judzi

Dates

2015-04-10Published

2011-11-22Filed