FIELD: measurement equipment.
SUBSTANCE: manufacturing method consists in the fact that on a planar side of an elastic element there formed by means of a vacuum sputtering method is a heterogeneous structure from nano- and micro-sized films of materials, which contains thin-film dielectric, resistive and contact layers. By using photolithography and etching there formed are strain elements (strain gauges), contact conductors and contact platforms to them. A piezoresistive layer is formed by means of a method of magnetron sputtering in a vacuum chamber with simultaneous use of two targets from nickel and titanium. The elastic element is installed onto a carrousel and heated; argon pressure is created, and then, the carrousel is rotated with the specified density of currents in sputtering zones of the first and the second targets; then, the elastic element with the piezoresistive layer applied onto it is exposed in vacuum at increased temperature during several hours.
EFFECT: possibility of controlled synthesis of thin-film resistive elements of nano- and micro-sized systems of sensors of physical values with the specified value of temperature coefficient of resistance.
7 dwg
