FIELD: chemistry.
SUBSTANCE: method for producing a spattering target of a magnetron source for coating application involves forming a recess in a metallic substrate by spattering a metallic substrate material in the magnetron source and filling the recess with a coating material. The recess in the metallic substrate is mechanically processed symmetrically from both sides, and its width is enlarged by 28…30% by removing the metallic substrate material along a recess profile.
EFFECT: ensuring the required spattering quality of especially pure expensive materials by eliminating impurities of the chemical composition of the deposited coatings by means of the substrate material.
1 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| COMBINED TARGET FOR A PLANAR MAGNETRON AND METHOD FOR ITS MANUFACTURE | 2022 |
|
RU2798494C1 |
| METHOD OF PREPARING AND RESTORING TARGET FOR MAGNETRON ATOMIZATION IN VACUUM | 1991 |
|
RU2068886C1 |
| MAGNETRON SPUTTERING DEVICE | 2018 |
|
RU2747487C2 |
| METHOD FOR APPLYING METAL COATINGS MADE OF COPPER AND COPPER ALLOYS TO GLASS PRODUCTS | 2021 |
|
RU2777094C1 |
| PROCEDURE FOR VACUUM APPLICATION OF COATING ON ITEMS OUT OF ELECTRIC CONDUCTING MATERIALS AND DIELECTRICS | 2009 |
|
RU2409703C1 |
| METHOD OF APPLICATION OF A NANOFILM COATING ON A SUBSTRATE | 2018 |
|
RU2681587C1 |
| PLANAR MAGNETRON WITH A ROTARY CENTRAL ANODE | 2022 |
|
RU2792977C1 |
| METHOD FOR CREATING TRANSPARENT CONDUCTIVE COMPOSITE NANO-COATINGS (OPTIONS) | 2016 |
|
RU2661166C2 |
| METHOD FOR PRODUCING ELECTRODE COATINGS FOR OPTOELECTRONIC DEVICES BASED ON HALIDE PEROVSKITES | 2022 |
|
RU2797895C1 |
| GAS-DISCHARGE SPUTTERING APPARATUS BASED ON PLANAR MAGNETRON WITH ION SOURCE | 2020 |
|
RU2752334C1 |
