FIELD: physics.
SUBSTANCE: disclosed is an optically transparent heterostructure for optoelectronic and magnetooptic devices, which consists of a dielectric substrate and a gold film thereon with a thickness of less than 5 nm, wherein the gold film is deposited in three steps: first a substrate made of yttrium-iron garnet, or bismuth-thulium-ferrite garnet, or calcium fluoride is coated with a gold film with a thickness of 2-4 nm using an ion-beam method by sputtering a gold target with a beam of oxygen ions with the energy greater than 1500 eV and ion beam current density of 0.1-0.25 mA/cm2, followed by removing the surface layer of the gold film when sputtering with a beam of oxygen ions with the energy less than 300 eV and beam current density of 0.1-0.15 mA/cm2 until the disappearance of metallic conduction on the surface of the substrate and finally re-depositing a gold film with a thickness of less than 5 nm by sputtering the gold target with a beam of oxygen ions with the energy greater than 1500 eV and ion beam current density of 0.1-0.25 mA/cm2.
EFFECT: invention enables to obtain high-quality optically transparent gold films.
4 dwg, 3 ex
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Authors
Dates
2016-01-10—Published
2014-12-03—Filed