FIELD: metallurgy.
SUBSTANCE: claimed process comprises the cleaning of plate surface by ion bombardment and TiN evaporation thereon by deposition in reactive gas, i.e. titanium ion nitrogen, from the plasma generated by vacuum-arc generator in the direction of anode fitted in the cathode. Note here that the anode is composed by the set of carbide inserts of the total surface area Sa meeting the following requirement: Sa<(2m/M)l/2S, where S is the hollow cathode surface area, m and M are electron and ion masses, respectively.
EFFECT: higher quality of coating.
1 ex
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Authors
Dates
2016-02-10—Published
2014-09-10—Filed