FIELD: physics.
SUBSTANCE: claimed process of configuring the active n-area of solar elements comprises the formation of phosphorus-silicate glass on the semiconductor plate surface from gas phase. Note here that dopant source is composed of liquid source of phosphorus oxychloride (POCl3) at the following ratio of components: nitrogen N2 = 280 l/h, oxygen O2 = 300 l/h, oxygen O2 = 15 l/h, nitrogen via feeder N2 = 14 l/h. This invention allows the phosphorus diffusion at 1000°C to get RS = 35±10 Ohm/cm.
EFFECT: reduced scatter of surface concentration over semiconductor plate, accelerated process, lower temperature.
3 ex
| Title | Year | Author | Number | 
|---|---|---|---|
| METHOD OF DIFFUSING PHOSPHOROUS FROM PHOSPHOROUS-SILICATE FILMS | 2008 | 
 | RU2371807C1 | 
| METHOD FOR FORMING TRANSISTOR EMITTER ZONE | 2013 | 
 | RU2542591C1 | 
| METHOD OF PHOSPHORUS DIFFUSION FROM HARD PLANAR SOURCE | 2008 | 
 | RU2359355C1 | 
| PRODUCTION OF POWER TRANSISTOR SOURCE AREA | 2014 | 
 | RU2567405C2 | 
| METHOD OF PRODUCING GLASS FROM PHOSPHORUS PENTOXIDE | 2013 | 
 | RU2524149C1 | 
| DIFFUSION OF PHOSPHORUS FROM PHOSPHORUS NITRIDE (PN) | 2013 | 
 | RU2524140C1 | 
| METHOD OF DIFFUSING BORON | 2006 | 
 | RU2361316C2 | 
| METHOD OF FORMING ACTIVE p-REGION OF SOLAR CELLS | 2014 | 
 | RU2575613C2 | 
| METHOD FOR PRODUCTION OF BOROSILICATE LAYERS IN MANUFACTURE OF POWER TRANSISTORS | 2020 | 
 | RU2786376C2 | 
| PRODUCTION OF POWER TRANSISTOR GATE AREA | 2014 | 
 | RU2594652C1 | 
Authors
Dates
2016-06-10—Published
2014-07-04—Filed